| 000 | 00611nam a2200205Ia 4500 | ||
|---|---|---|---|
| 001 | 57892 | ||
| 008 | 140507s9999 xx 000 0 und d | ||
| 020 | _a0780334167 | ||
| 040 | _cPK-LaUMT | ||
| 082 |
_a 621.3815 _bBAK-C |
||
| 100 | _aBaker, R. Jacob | ||
| 245 |
_aCMOS circuit design, layout, and simulation _cBaker, R. Jacob<>Li, Harry W.<>Boyce, David E. |
||
| 260 |
_aNew York,USA: _bJohn Wiley & Sons, _c1998 |
||
| 300 | _a902 p. | ||
| 546 | _aEN | ||
| 650 | _aMetal oxide semiconductors, complementary-Design and construction | ||
| 700 | _aBoyce, David E. | ||
| 700 | _aLi, Harry W. | ||
| 942 | _cBK | ||
| 999 |
_c55158 _d55158 |
||